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常壓清潔應用  >  常壓清潔應用設備
常壓清潔應用設備
先進光電半導體鍍膜設備( Advanced Semiconductor thin film coating equipment) 低溫大氣壓電漿鍍膜設備(Low Temperature Atmospheric Environmental Plasma Coating Equipmnet) 現今光電半導體材料鍍膜常需要用到真空電漿鍍膜系統,缺點是設備昂貴,也需要不少設備維護成本,更重要的是,製程常用到危險化學品與特殊氣體。 我們在這裡供客戶與合作伙伴,全球最先進及環保的光電半導體材料鍍膜設備與製程技術-低溫大氣壓電漿鍍膜設備,它不需要真空系統,也不需要使用有毒的前趨物來當原料,卻能以有效的方式來進行奈米級光電材料鍍膜,可以加速相關應用技術的開發,也減少相關的風險成本,為客戶的研究開發暨量產,領先同業競爭者,產生更多附加價值與應用的機會。 Without aePlasma Technology, thin film semiconductor coating needs vacuum environment which is high cost and toxic precursors and gases which is high risk for operator. Today, aeplasma 41 Co., Ltd provide low temperature atmospheric environmental (atmospheric pressure) coating equipment and process technology, which is toxic free process and high coating efficiency. Decreasing process operation risk and speed-up new product research and development, even mass production schedule. Low temperature atmospheric environmental (atmospheric pressure) coating equipment help customers and partners creating collaboration opportunities and value-added on product. Win-win, collaboration, friendly ECO-system will come true through your wise decision.